出版國(guó)家:Netherlands
出版周期:雙月刊
影響因子:2.902
研究領(lǐng)域:運(yùn)動(dòng)、肌肉收縮
5年影響因子:4.026
國(guó)外數(shù)據(jù)庫(kù)收錄:IM,2.902" />
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Isprs journal of photogrammetry and remote sensing


Isprs journal of photogrammetry and remote sensing
影響因子: 2.902
I S S N: 0924-2716
出 版 社: Elsevier
出 版 地: Amsterdam
出版國(guó)家: Netherlands
刊  期: 雙月刊
創(chuàng)刊時(shí)間: 1989
語(yǔ)  種: 英文
審稿周期: 偏慢,4-8周
中科院分區(qū): 2
投稿命中率: 一般
國(guó)外數(shù)據(jù)庫(kù)收錄: IM
中國(guó)收錄文章數(shù):
5年影響因子: 4.026
研究領(lǐng)域: 運(yùn)動(dòng)、肌肉收縮
官方鏈接: http://www.sciencedirect.com/science/journal/09242...
投稿須知: http://www.sciencedirect.com/science/journal/09242...

期刊介紹:

ISPRS Journal of Photogrammetry and Remote Sensing (P&RS) is the official journal of the International Society for Photogrammetry and Remote Sensing (ISPRS). The journal is to provide a channel of communication for scientists and professionals in all countries working in the many disciplines employing photogrammetry, remote sensing, spatial information systems, computer vision, and other related fields. The Journal is designed to serve as a source reference and archive of advancements in these disciplines.The P&RS objective is to publish high quality, peer-reviewed, preferably previously unpublished papers of a scientific/research, technological development or application/practical nature. P&RS will publish papers, including those based on ISPRS meeting presentations, which are regarded as significant contributions in the above-mentioned fields. We especially encourage papers: of broad scientific interest; on innovative applications, particularly in new fields; of an interdisciplinary nature; on topics that have not been dealt with (or to a small degree) by P&RS or related journals; and on topics related to new possible scientific/professional directions. Preferably, theoretical papers should include applications, and papers dealing with systems and applications should include theoretical background. The scope of the journal is extensive and covers sensors, theory and algorithms, systems, experiments, developments and applications.
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